Global Copper Sputtering Target Market Share Is Likely To Reach At A CAGR Value Of Around 6.5% By 2028

06-Oct-2022 | Facts and Factors

According to Facts and Factors, the global Copper Sputtering Target market size was worth around USD 1.2 billion in 2021 and is predicted to grow to around USD 1.9 billion by 2028 with a compound annual growth rate (CAGR) of roughly 6.5% between 2022 and 2028.

Global Copper Sputtering Target Market Size

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The copper sputtering target is a coating formed of metallic copper that can be used for a variety of sputtering processes, including DC bipolar, three-pole, four-stage, radio frequency, counter target, ion beam, and magnetron. It can be used to create films for displays, integrated circuits, semiconductors, capacitors, decorative films, protective films, reflecting films, conductive films, and more. Because copper targets are less expensive than other precious metal sputtering targets, they are the target of choice when it comes to fulfilling the needs of the film layer.

Browse the full “Copper Sputtering Target Market Size, Share, Growth Analysis Report By Type (Low Purity Copper Sputtering Target, High Purity Copper Sputtering Target, and Ultra High Purity Copper Sputtering Target), By Application (Semiconductors, Solar Cell, LCD Displays, and Others), and By Region - Global and Regional Industry Insights, Overview, Comprehensive Analysis, Trends, Statistical Research, Market Intelligence, Historical Data and Forecast 2022 – 2028" report at https://www.fnfresearch.com/copper-sputtering-target-market

The global need for semiconductors and solar cells is a crucial factor in the growth of the global copper sputtering target market. In addition, the expanding automotive sector in developing nations like China and India is anticipated to drive market expansion over the forecast year. Additionally, the growing usage of cutting-edge technologies like the Internet of Things (IoT), artificial intelligence (AI), and other similar technologies is anticipated to boost market growth throughout the forecast period. However, difficulty in putting uniformly targets of complex structures and low deposition rate for some materials in the sputtering target technique is likely to restrict the market growth. Whereas, the advancement and innovation in the technology associated with the copper sputtering target by well-established and emerging manufacturers are expected to create potential opportunities over the forecast period.

The global copper sputtering target market is segmented based on type, application, and region.

Low purity copper sputtering target, high purity copper sputtering target, and ultra-high purity copper sputtering target are the three categories into which the global market is divided based on type. During the projection period, the target for high-purity copper sputtering is anticipated to expand at the greatest CAGR. The maximum purity is 99.9999%. The films' exceptional level of electrical conductivity and reduced particle production during the PVD process are the main advantages. But over the anticipated period, ultra-high purity copper sputtering increased significantly. The copper that is 99.999% or more pure is used to make ultra-high purity copper sputtering targets. It is the highest grade of copper sputtering target and must meet the strictest standards for performance and quality. Ultra-high purity copper sputtering target is mainly used in semiconductor applications, such as integrated circuits (ICs), photo volts, transistors, and other electronic components.

The global copper sputtering target market is divided into semiconductors, solar cells, LCD displays, and others based on the application. The semiconductor industry dominated the market in 2021, and this dominance is anticipated to continue throughout the forecast period. Copper is commonly used as a sputtering target in semiconductor devices due to its high conductivity and availability in pure form. The requirement for metal-insulator-metal capacitors, which are used to power portable electronics, has grown along with the size of transistors, which have shrunk. However, the reactivity of copper with oxygen and other ambient elements when used in semiconductor devices may reduce the lifetime of the device. As a result, attempts are being conducted to find new defenses against copper's air-related degradation.

The market for Copper Sputtering Target is divided into five regions based on geography: North America, Europe, Asia Pacific, the Middle East & Africa, and Latin America. In terms of revenue, the North American copper sputtering targets market led in 2021. Sputtering targets are in high demand in the semiconductor industry due to rising consumer electronics product demand, and the North American market is expanding due to an increase in coating applications for these materials in the automotive and aerospace & military sectors.

Report Scope

Report Attribute

Details

Market Size in 2021

USD 1.2 Billion

Projected Market Size in 2028

USD 1.9 Billion

CAGR Growth Rate

6.5% CAGR

Base Year

2021

Forecast Years

2022-2028

Key Market Players

American Elements, JX Nippon Mining & Metals Corporation, Sumitomo Metal Mining Co. Ltd., Honeywell International Inc., Praxair Technology Inc., Vital Materials Co. Limited, Alfa Aesar, Thermo Fisher Scientific, Plansee SE, Mitsubishi Materials Corporation, VEM, and others.

Key Segment

By Type, Application, and Region

Major Regions Covered

North America, Europe, Asia Pacific, Latin America, and the Middle East &, Africa

Purchase Options

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The global copper sputtering target market is dominated by players like American Elements, JX Nippon Mining & Metals Corporation, Sumitomo Metal Mining Co., Ltd., Honeywell International Inc., Praxair Technology, Inc., Vital Materials Co., Limited, Alfa Aesar, Thermo Fisher Scientific, Plansee SE, Mitsubishi Materials Corporation, VEM, among others.

Recent Development:

In November 2020, Mitsubishi Chemical Corporation concluded an agreement with Konfoong Materials International Co., Ltd. and KFMI Group Company TCPR (Shanghai) Electro-Mechanical High-Tech Co., Ltd. for the transfer of MCC’s light metal products business. This acquisition was to enhance portfolio management of sputtering target materials for semiconductors and liquid crystal displays.

The global copper sputtering target market is segmented as follows:

By Type

  • Low Purity Copper Sputtering Target
  • High Purity Copper Sputtering Target
  • Ultra-High Purity Copper Sputtering Target

By Application

  • Semiconductors
  • Solar Cell
  • LCD Displays
  • Others

By Region

  • North America
    • The U.S.
    • Canada
    • Mexico
  • Europe
    • France
    • The UK
    • Spain
    • Germany
    • Italy
    • Nordic Countries
      • Denmark
      • Sweden
      • Norway
    • Benelux Union
      • Belgium
      • The Netherlands
      • Luxembourg
    • Rest of Europe
  • Asia Pacific
    • China
    • Japan
    • India
    • Australia
    • South Korea
    • Southeast Asia
      • Indonesia
      • Thailand
      • Malaysia
      • Singapore
      • Rest of Southeast Asia
    • Rest of Asia Pacific
  • The Middle East & Africa
    • Saudi Arabia
    • UAE
    • Egypt
    • South Africa
    • Rest of the Middle East & Africa
  • Latin America
    • Brazil
    • Argentina
    • Rest of Latin America

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